11.04.2016
AIXTRON SE DE000A0WMPJ6
AIXTRON SE: AIXTRON partners with Institut Lafayette on further advancement of organic deposition technology OVPD
DGAP-Media / 11.04.2016 / 12:10
AIXTRON partners with Institut Lafayette on further advancement of organic
deposition technology OVPD
AIXTRON cluster tool successfully installed and ready for customer tests at
French innovation platform
Herzogenrath/Germany, April 11, 2016 - AIXTRON SE (FSE: AIXA; NASDAQ:
AIXG), one of the world's leading manufacturers of deposition systems for
the semiconductor industry, announces that a new organic vapor phase
deposition (OVPD) system of the company which is capable of handling
200x200 mm substrates has been installed and successfully tested at
Institut Lafayette. The installation of this custom built system marks a
key milestone and moves Institut Lafayette, which is part of the Georgia
Institute of Technology international campus in Metz (France), one step
closer to its fully operational phase.
The newly tested OVPD cluster tool and the previously installed metal oxide
chemical vapor phase deposition (MOCVD) tool constitute the two flagship
semiconductor growth capabilities at Institut Lafayette. They complete the
existing full set of tools covering all key enabling technologies necessary
to the fabrication, testing, and pre-production prototyping of
optoelectronic devices that are housed in a 500 sqm clean room.
AIXTRON's OEC-200 OVPD system is currently comprised of eight STExS (Short
Thermal Exposure Source) that transform solid organic electronic materials
into the gas phase through a rapid and efficient process, minimizing
overall heat exposure that can be damaging for certain materials. Materials
in the gas phase are transferred by a controlled hot-carrier gas onto
cooled substrates using AIXTRON's showerhead technology in a chamber at
low-vacuum levels (mbar range). The rate of the materials deposited by this
technique (up to 5 nm/s) can be adjusted by controlling the flux and
material concentration of hot gases mixing in the showerhead, allowing for
great control of film thickness and precise composition. The deposition
chamber is connected to a vacuum deposition chamber allowing for the
deposition of metal electrodes for the demonstration and testing of
operating devices.
With its unique features, OVPD has the potential to alleviate the current
limitations and concerns existing with conventional vacuum thermal
evaporation (VTE). It could become the next-generation deposition
technology for the large-scale, low-cost production of emerging organic
electronic devices including organic light-emitting diodes (OLEDs) for
displays and solid state lighting, and organic photovoltaic devices for
renewable power generation.
AIXTRON's showerhead technology used within the OVPD process has the
advantage of being easily scalable as illustrated by the recent deposition
results using the new Gen8 OVPD demonstrator that has been put into
operation at AIXTRON's headquarters in Herzogenrath, Germany.
With its own team of engineers in organic-electronic technology and unique
R&D fabrication and testing facilities, Institut Lafayette is ready for
tests with potential customers and committed to further validate OVPD as
the next generation deposition technology of choice.
Recognizing their complementary strength and long history in the
development of semiconductor materials and devices, and in providing
deposition equipment for the semiconductor industry, Institut Lafayette and
AIXTRON, respectively, have agreed to enter into a partnership. Therefore,
both parties signed a Memorandum of Understanding during a high-level visit
to Metz on April 8, 2016 in the presence of Thierry Mandon, French Minister
of Higher Education and Research, and Marianne There-Mano, German Consul in
Strasbourg as well as Stefan Kern, premier advisor for scientific and
technological affairs to the German Embassy.
Abdallah Ougazzaden, Professor at the Georgia Institute of Technology and
Co-President of Institut Lafayette, said: "We have been very pleased with
AIXTRON's extensive support while commissioning, testing, and installing
both our MOCVD and OVPD tools. Based on this trustful relationship, we are
confident that we will achieve our common objectives."
"We are delighted to co-operate with an international research institution
like Georgia Tech and its Institut Lafayette to support innovations in
optoelectronics and advanced semiconductor materials research by providing
our leading OVPD and MOCVD manufacturing equipment. We are looking forward
to a vibrant partnership for further developing future-oriented and
groundbreaking semiconductor technologies", said Martin Goetzeler, CEO of
AIXTRON SE.
Bernard Kippelen, Professor at the Georgia Institute of Technology and
Co-President of Institut Lafayette, commented: "Reaching the operational
phase with our OPVD tool is an important milestone for our newly-created
innovation platform. Our teams and partners on both sides of the Atlantic
have been working relentlessly to reach this point. It is another
illustration of the strength of the long partnership between Georgia Tech,
Metz, and Lorraine."
About AIXTRON
AIXTRON SE is a leading provider of deposition equipment to the
semiconductor industry. The Company was founded in 1983 and is
headquartered in Herzogenrath (near Aachen), Germany, with subsidiaries and
sales offices in Asia, Europe and in the United States. AIXTRON's
technology solutions are used by a diverse range of customers worldwide to
build advanced components for electronic and opto-electronic applications
based on compound, silicon, or organic semiconductor materials. Such
components are used in a broad range of innovative applications,
technologies and industries. These include LED applications, display
technologies, data storage, data transmission, energy management and
conversion, communication, signaling and lighting as well as a range of
other leading-edge technologies.
OVPD(R) technology has been exclusively licensed to AIXTRON from Universal
Display Corporation (UDC), Ewing, N.J. USA for equipment manufacture.
OVPD(R) technology is based on an invention by Professor Stephen R. Forrest
et al. at Princeton University, USA, which was exclusively licensed to UDC.
AIXTRON and UDC have jointly developed and qualified OVPD(R) pre-production
equipment.
Our registered trademarks: AIXACT(R), AIXTRON(R), Atomic Level
SolutionS(R), Close Coupled Showerhead(R), CRIUS(R), Gas Foil Rotation(R),
OVPD(R), Planetary Reactor(R), PVPD(R), TriJet(R), Optacap(TM)
For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6; NASDAQ:
AIXG, ISIN US0096061041) please visit our website at: www.aixtron.com.
About Institut Lafayette
Institut Lafayette is an innovation platform recently established on the
Technopole of Metz, France, in partnership with the Georgia Institute of
Technology. Its mission is to support public research institutions and
private companies by providing technology transfer and commercialization
services, access to state-of-the-art technical infrastructure, and
technical expertise in the field of new semiconductor materials, components
and devices for optoelectronic applications. It is a French private
not-for-profit entity funded in part by the French government, local
government entities, and the EU through FEDER funds.
Forward-Looking Statements
This document may contain forward-looking statements regarding the
business, results of operations, financial condition and earnings outlook
of AIXTRON within the meaning of the safe harbor provisions of the US
Private Securities Litigation Reform Act of 1995. These statements may be
identified by words such as "may", "will", "expect", "anticipate",
"contemplate", "intend", "plan", "believe", "continue" and "estimate" and
variations of such words or similar expressions. These forward-looking
statements are based on our current views and assumptions and are subject
to risks and uncertainties. You should not place undue reliance on these
forward-looking statements. Actual results and trends may differ materially
from those reflected in our forward-looking statements. This could result
from a variety of factors, such as actual customer orders received by
AIXTRON, the level of demand for deposition technology in the market, the
timing of final acceptance of products by customers, the condition of
financial markets and access to financing for AIXTRON, general conditions
in the market for deposition plants and macroeconomic conditions,
cancellations, rescheduling or delays in product shipments, production
capacity constraints, extended sales and qualification cycles, difficulties
in the production process, the general development in the semi-conductor
industry, increased competition, fluctuations in exchange rates,
availability of public funding, fluctuations and/or changes in interest
rates, delays in developing and marketing new products, a deterioration of
the general economic situation and any other factors discussed in any
reports or other announcements filed by AIXTRON with the U.S. Securities
and Exchange Commission. Any forward-looking statements contained in this
document are based on current expectations and projections of the executive
board and on information currently available to it and are made as at the
date hereof. AIXTRON undertakes no obligation to revise or update any
forward-looking statements as a result of new information, future events or
otherwise, unless expressly required to do so by law.
End of Media Release
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Issuer: AIXTRON SE
Key word(s): Industry
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Language: English
Company: AIXTRON SE
Dornkaulstraße 2
52134 Herzogenrath
Germany
Phone: +49 (2407) 9030-0
Fax: +49 (2407) 9030-40
E-mail: [email protected]
Internet: www.aixtron.com
ISIN: DE000A0WMPJ6, US0096061041
WKN: A0WMPJ, A0D82P
Indices: TecDAX
Listed: Regulated Market in Frankfurt (Prime Standard); Regulated
Unofficial Market in Berlin, Dusseldorf, Munich,
Stuttgart; Terminbörse EUREX; Nasdaq
End of News DGAP Media
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